RMS VISION SYSTEMS Optical CD/Overlay
PRODUCTS
RMS Vision Systems Inc. USA | TEL 805-222-5430
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Optical CD/Overlay |
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Optical Critical Dimension (CD) and
Overlay metrology is a fast, precise, and non-destructive measurement technique. CD features below
0.5 um typically require an Scanning Electron Microscope (SEM),
however overlay measurements are best done optically. For many device technologies
with larger CD features such as MEMS,
power devices, LEDs, etc. Optical CD is preferred.
The CD/ Overlay option includes a high quality, high
power microscope with high-resolution color/ or BW digital
CCD camera, and proprietary algorithms optimized for
extracting extremely accurate line width and spacing
measurements. For many applications, color difference
(wavelength) information can be utilized to
enhance resolution and reliability by several
factors. This powerful proprietary technology (known as Chromatic
Edge Contrast (CEC)) was developed by RMS in conjunction
with high resolution color imaging to effectively eliminates the need
for costly UV illumination for many applications.
Performance Specification*
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CD |
Overlay |
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Repeatability/ Resolution < 5
nm Throughput < 1 sec / measurement Feature size > 0.5 um |
Repeatability/ Resolution < 2
nm Throughput < 1 sec /
measurement TIS < 2 nm (calibrated) |
*Confirmed on
customer
samples.
Actual Overlay performance
comparison with Leading Competitor:
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Max |
Min |
Range |
Mean |
1-sigma |
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Leading |
-0.1236 |
-0.12702 |
0.00342 |
-0.12467 |
0.00134 |
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RMS |
-0.13539 |
-0.13703 |
0.00164 |
-0.13606 |
0.00062 |
Application:
CD
Measurement on FET features
(PowerPoint Show, 5 sec download time)
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Copyrights © 2009, RMS Vision Systems, Inc. All rights reserved. |
